Exam Details

Subject materials processing
Paper
Exam / Course m.sc. in physics
Department
Organization solapur university
Position
Exam Date April, 2018
City, State maharashtra, solapur


Question Paper

M.Sc. (Semester III) (CBCS) Examination Mar/Apr-2018
Physics (Materials Science)
MATERIALS PROCESSING
Time: 2½ Hours
Max. Marks: 70
Instructions: Q.1 and Q.2 are compulsory. Attempt any three questions from Q. 3 to 7. All questions carry equal marks.
Q.1

Objective Questions:
06
The capillary nucleation theory considers the
Interface energy of the film and substrate
Roughness of the Substrate
Melting point of the Substrate
All of the above
In resistive evaporation the filaments are usually made of refractory metals such as Tungsten or Tantalum mainly because of their
Melting point
Conductivity
Ductility
Hardness
In physisorption due to adsorption of the adsorbate molecules the electronic structure of the surface atoms
Changes irrespective of the adsorbate concentration
Does not change irrespective of the adsorbate concentration
Changes with respect to the adsorbate concentration
None of the above
The atmospheric pressure is equal to
760 Torr
1 Torr
7.6 Torr
76 Torr
The sticking coefficient depends on
Substrate temperature
Substrate area
Substrate shape
None of the above
DC sputtering cannot be used for deposition of
Metal
Alloy
Oxide
All above

State True or False:-
08
Ion pump is noise free.
Low nucleation rate results into deposition of thin film of large grain size.
Quartz crystal measures thickness by measuring change in oscialltion frequency.
Electrodeposition can be used to deposit only conducting substrates.
MBE is a deposition technique for growing epitaxial film in ambient condition.
In chemisorptions, a strong chemical bond is formed between the adsorbate atom or molecule and the substrate.
In case of MOCVD we may get carbon impurity.
McLeod gauge can be used for continuous measurement of vacuum.
Page 2 of 2
SLR-UN-482
Q.2
Write short answer:
14
Sticking coefficient
05
Titanium sublimation pump
05
Cathode arc deposition
04
Q.3
Discuss fundamentals of diffusion, further explain grain boundary and thin film diffusion.
10
How stress is generated in thin films?
04
Q.4
Discuss in brief different types of sputtering.
10
What are different advantages and disadvantages of CVD over PVD?
04
Q.5
How environment for thin film deposition and deposition parameters affect the film growth?
10
Discuss spray pyrolysis.
04
Q.6
Discuss different types of thermal evaporation deposition methods.
10
Explain quartz crystal film thickness measurement.
04
Q.7
Write the principle of rotary, diffusion and turbo molecular pump.
10
Explain different vacuum gauges?
04


Subjects

  • advanced techniques of materials characterization
  • analog & digital electronics
  • analog & digital electronics]
  • analytical techniques
  • atomic, molecular & nuclear physics
  • classical mechanics
  • condensed matter physics
  • dielectric & ferroel
  • ectric properties of materials
  • electrodynamics
  • magnetic materials
  • materials processing
  • microelectronics
  • physics of nano materials
  • quantum mechanics
  • semiconductor devices
  • statistical mechanics