Exam Details

Subject materials processing
Paper
Exam / Course m.sc. in physics
Department
Organization solapur university
Position
Exam Date 22, April, 2017
City, State maharashtra, solapur


Question Paper

Physics (Materials Science(Semester III) (CBCS) Examination,
2017
MATERALS PROCESSING
wateriI
Day Date: Saturday, 22-04-2017 Max. Marks: 70
Time: 02.30 PM to 05.00 PM
N.B. Questions NO.1 and 2 are Compulsory.
Attempt any three questions from Q.NO.3 to Q.NO.7
Figures to the right indicate full marks.
Q.1 Objective question. 14
Choose the correct alternative given in the bracket. 06
The capillary nucleation theory considers the
ca Interface energy of the film and substrate
Roughness of the Substrate
Melting point of the Substrate
All of the above
2 In resistive evaporation the filaments are usually made of
refractory metals such as Tungsten or Tantalum mainly
because of their
Melting point Conductivity
Ductility Hardness
3 In physisorption due to adsorption of the adsorbate
moleculesthe electronic structure of the surface
Changes irrespective of the adsorbate concentration.
Does not change irrespective of the adosebate
concentration
Changes with respect to the adsoebate concentration
None of the above
4 The atmospheric pressure is equal to
760 Torr 1 Torr 7.6 Torr 76 Torr
5 The sticking coefficient depends on
Substrate temperature Substrate area
Substrate shape None of the above
6 DC sputtering cannot be used for deposition of
Metal Alloy
Oxide All above
State True or False/ Fill in the blanks: 08
Lump is noise free.
Low nucleation rate results into deposition of thin film of large
grain size.
Page 2 of 2
Quartz crystal measures thickness by measuring change in
oscillation frequency.
Electrode position can be used to deposit only conducting
substrates.
MSE is a deposition technique for growing epitaxial film in
ambient condition.
In chemisorptions, a Strongchemical bond is formed between
the adsorbate atom or molecule and the substrate.
In case of MCVD we may get carbon impurity.
McLeod gauge can be used for continuous measurement of
vacuum.
Q.2 Write a short note on following: 14
Sticking coefficient
Titanium sublimation pump
Cathode arc deposition
Q.3 Discuss fundamentals of diffusion, further explain grain boundary
and thin film diffusion.
10
How stress is generated in thin films? 04
Q.4 Discuss in brief different types of sputtering. 10
What are different advantages and disadvantages of CVD over
PVD?
04
Q.5 How environment for thin film deposition and deposition
parameters affect the film growth?
10
Discus spray pyrolysis 04
Q.6 Discuss different types of thermal evaporation deposition methods. 10
Explain quartz crystal film thickness measurement. 04
Q.7 Write the principles of rotary, diffusion and turbo molecular pump. 10
Explain different vacuum gauges? 04


Subjects

  • advanced techniques of materials characterization
  • analog & digital electronics
  • analog & digital electronics]
  • analytical techniques
  • atomic, molecular & nuclear physics
  • classical mechanics
  • condensed matter physics
  • dielectric & ferroel
  • ectric properties of materials
  • electrodynamics
  • magnetic materials
  • materials processing
  • microelectronics
  • physics of nano materials
  • quantum mechanics
  • semiconductor devices
  • statistical mechanics